Area Selective Atomic Layer Deposition for the Use on Active Implants: An Overview of Available Process Technology

Area-selective atomic layer deposition (ASD) offers wide-ranging potential for the use on active implants. As the active implants consist of heterogeneous materials, this provides an excellent basis for the application of ASD. In this review, processes for the application on active implants and possible application scenarios are highlighted.

Abstract

Area-selective atomic layer deposition (ASD) is a bottom-up process that is of particular importance in the semiconductor industry, as it prevents edge defects and avoids cost-intensive lithography steps. This approach not only offers immense potential for the manufacture of active implants but can also be used to improve them. This review paper presents various processes that can be used for this purpose. It also identifies aspects that shall be considered when implementing such a process for medical applications. For example, the inherent selectivity can be used to produce new biosensors, the passivated ASD can be used to encapsulate polymer-based implants, and the activated ASD can be used to improve electrode performance. Finally, the aspects that shall be considered in a coating for active implants are highlighted. ASD therefore offers great potential for use on active implants.